Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
COMPOSITION AND PHOTOSENSITIVE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2023/047855
Kind Code:
A1
Abstract:
The present invention provides: a photosensitive composition which is not susceptible to an excessive decrease in the weight of components in the photosensitive composition or composition (in cases where the photosensitive composition or composition contains a solvent, in the weight of components other than the solvent) even if heated, and in which inorganic fine particles are stably dispersed for a long period of time; a cured product of this photosensitive composition; a compound which is preferably blended in this photosensitive composition; and a method for producing this compound. According to the present invention, a composition which contains a photopolymerizable compound (A) and inorganic fine particles (B), or a photosensitive composition which contains a photopolymerizable compound (A), inorganic fine particles (B) and an initiator (C) uses, as the photopolymerizable compound (A), a compound that has a specific structure comprising a radically polymerizable group-containing group or a cationically polymerizable group-containing group.

Inventors:
SUGAWARA RYUTARO (JP)
ASABA TAKURO (JP)
Application Number:
PCT/JP2022/031268
Publication Date:
March 30, 2023
Filing Date:
August 18, 2022
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
C08F2/44; C07C67/14; C07C69/54; C07C253/30; C07C255/54; C07D217/00; C07D277/74; C08F20/10
Domestic Patent References:
WO2019065608A12019-04-04
WO2018095369A12018-05-31
Foreign References:
JP2013227393A2013-11-07
JP2013064127A2013-04-11
JP2015206010A2015-11-19
KR20140000636A2014-01-03
JP2012185477A2012-09-27
JPH0558950A1993-03-09
JPH0629043A1994-02-04
JPH1180114A1999-03-26
JPH05311102A1993-11-22
JP2012092307A2012-05-17
Attorney, Agent or Firm:
SHOBAYASHI Masayuki et al. (JP)
Download PDF: