Title:
COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND
Document Type and Number:
WIPO Patent Application WO/2020/040045
Kind Code:
A1
Abstract:
Provided are: a composition that has excellent stability during storage and excellent stability during use; and a production method for the composition. This composition includes a compound (A) represented by general formula (1), and a compound (B) represented by general formula (2), wherein the contained amount of the compound (B) is 0.00002-0.2 parts by mass with respect to 100 parts by mass of the compound (A). (1): (R1-COO)n-R2-(NCO)m, (2): (R1-COO)n-R2-(R3-R1)m (In general formula (1) and general formula (2), R1 represents an ethylenically unsaturated group having 2-7 carbon atoms, and R2 represents an (m+n)-valent hydrocarbon group having 1-7 carbon atoms and optionally includes an ether group. R1 and R2 in general formula (1) are respectively identical to R1 and R2 in general formula (2). In general formula (2), R3 represents -NHC(=O)-. n and m each represent an integer of one or two.)
Inventors:
NISHIMURA NORIHITO (JP)
OHNO KATSUTOSHI (JP)
OHNO KATSUTOSHI (JP)
Application Number:
PCT/JP2019/032105
Publication Date:
February 27, 2020
Filing Date:
August 16, 2019
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
International Classes:
C07C265/04; C07C231/10; C07C233/09; C07C233/18; C07C263/10; C07C263/20; C07C269/02; C07C271/16; C07C271/60; C07C333/04; C07D231/12; C08G18/81; C07B61/00
Domestic Patent References:
| WO2018070541A1 | 2018-04-19 | |||
| WO2008143207A1 | 2008-11-27 | |||
| WO2011074503A1 | 2011-06-23 |
Foreign References:
| JPH11228523A | 1999-08-24 | |||
| JP2016150922A | 2016-08-22 | |||
| JP2007055993A | 2007-03-08 | |||
| JP4823546B2 | 2011-11-24 | |||
| JP2018104365A | 2018-07-05 | |||
| JP2018154145A | 2018-10-04 | |||
| US2821544A | 1958-01-28 | |||
| JPH06322051A | 1994-11-22 | |||
| JPH06187822A | 1994-07-08 | |||
| JPS60234582A | 1985-11-21 | |||
| JPS60234583A | 1985-11-21 | |||
| JPH06184256A | 1994-07-05 | |||
| JP4273531B2 | 2009-06-03 | |||
| JPS4823546B1 | 1973-07-14 | |||
| JP2007008828A | 2007-01-18 |
Other References:
"CMC Technical Library", April 2005, CMC PUBLISHING CO., LTD., article "Polymer degradation mechanism and stabilization technology", pages: 168
Attorney, Agent or Firm:
OIKAWA Shu et al. (JP)
Download PDF: