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Patent Searching and Data


Title:
COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND
Document Type and Number:
WIPO Patent Application WO/2020/040049
Kind Code:
A1
Abstract:
This composition includes a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), wherein the contained amount of the compound (B) is 0.00002-2.0 parts by mass with respect to 100 parts by mass of the compound (A). (1): (R1-COO)n-R2-(NCO)m, (2): (R1-COO)n-R2-NHC(=O)NH-R2-(OCO-R1)m. (In general formula (1) and general formula (2), R1 represents an ethylenically unsaturated group having 2-7 carbon atoms, and R2 represents an (m+n)-valent hydrocarbon group having 1-7 carbon atoms and optionally includes an ether group. R1 and R2 in general formula (1) are respectively identical to those in general formula (2). n and m each represent an integer of one or two.)

Inventors:
NISHIMURA NORIHITO (JP)
OHNO KATSUTOSHI (JP)
Application Number:
PCT/JP2019/032135
Publication Date:
February 27, 2020
Filing Date:
August 16, 2019
Export Citation:
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Assignee:
SHOWA DENKO KK (JP)
International Classes:
C07C265/04; C07C231/10; C07C233/18; C07C263/10; C07C269/02; C07C271/16; C07C271/60; C07C275/10; C07C333/04; C07D231/12; C08G18/81; C07B61/00
Domestic Patent References:
WO2011074503A12011-06-23
Foreign References:
JP2016150922A2016-08-22
JP2006232797A2006-09-07
JPS6442462A1989-02-14
JPS5517357A1980-02-06
JP2002507642A2002-03-12
JP2018154146A2018-10-04
US2821544A1958-01-28
JPH06322051A1994-11-22
JPH06187822A1994-07-08
JPS60234582A1985-11-21
JPS60234583A1985-11-21
JPH06184256A1994-07-05
JP4273531B22009-06-03
JPS4823546B11973-07-14
JP2007008828A2007-01-18
Other References:
CMC TECHNICAL LIBRARY: "Polymer degradation mechanism and stabilization technology", CMC PUBLISHING CO., pages: 168
See also references of EP 3842415A4
Attorney, Agent or Firm:
OIKAWA Shu et al. (JP)
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