Title:
COMPOSITION FOR RESIST PATTERN METALATION PROCESS
Document Type and Number:
WIPO Patent Application WO/2020/203852
Kind Code:
A1
Abstract:
[Problem] To provide: a composition which enables amelioration of roughness or collapse of a resist pattern and improvement of etching resistance by metalating a resist of the resist pattern; and a metalation method for a resist pattern, which uses this composition. [Solution] A composition for a resist pattern metalation process, which contains (A) at least one substance that is selected from the group consisting of (a1) metal oxides, (a2) hydrolyzable silane compounds, (a3) hydrolysis products of the hydrolyzable silane compounds and (a4) hydrolysis-condensation products of the hydrolyzable silane compounds, (B) an acid compound that does not contain a carboxylic acid group (-COOH), and (C) an aqueous solvent; and a resist pattern metalation method which uses the above-described composition and provides a resist pattern wherein the components of the composition have permeated through the resist.
Inventors:
SHIBAYAMA WATARU (JP)
TAKEDA SATOSHI (JP)
SHIGAKI SHUHEI (JP)
ISHIBASHI KEN (JP)
KATO KODAI (JP)
NAKAJIMA MAKOTO (JP)
TAKEDA SATOSHI (JP)
SHIGAKI SHUHEI (JP)
ISHIBASHI KEN (JP)
KATO KODAI (JP)
NAKAJIMA MAKOTO (JP)
Application Number:
PCT/JP2020/014232
Publication Date:
October 08, 2020
Filing Date:
March 27, 2020
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/20; G03F7/40
Domestic Patent References:
| WO2015053194A1 | 2015-04-16 | |||
| WO2009104552A1 | 2009-08-27 | |||
| WO2014021256A1 | 2014-02-06 |
Foreign References:
| JP2013040993A | 2013-02-28 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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