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Title:
COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2008/013030
Kind Code:
A1
Abstract:
Disclosed is a resist composition containing a base component (A) whose alkali solubility is varied by the action of an acid, and an acid generator component (B) which generates an acid when exposed to light. The acid generator component (B) contains an acid generator (B1) composed of a compound represented by the general formula (b1-3) below. In the formula, R41, R42 and R43 independently represent an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; n1 represents an integer of 0-3, n2 represents an integer of 0-3 and n3 represents an integer of 0-2, provided that n1, n2 and n3 are not 0 at the same time; and X- represent an anion.

Inventors:
IWAI TAKESHI (JP)
IRIE MAKIKO (JP)
Application Number:
PCT/JP2007/063290
Publication Date:
January 31, 2008
Filing Date:
July 03, 2007
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
IWAI TAKESHI (JP)
IRIE MAKIKO (JP)
International Classes:
C07D333/54; C07C309/06; C07D333/56; G03F7/004; G03F7/039; H01L21/027
Foreign References:
JP2004521372A2004-07-15
Other References:
KITAMURA T. ET AL.: "Novel [4 + 2]-Cycloaddition of 1-Phenyl-1-benzothiophenium Salts with Dienes. Experimental Evidence for a Lack of Aromaticity in the Thiophene Ring", JOURNAL OF ORGANIC CHEMISTRY, vol. 68, no. 3, 2003, pages 731 - 735, XP003020727
KITAMURA T. ET AL.: "Novel phenyl migration of 1-phenylbenzo[b]thiophenium triflates in the thermolysis", TETRAHEDRON LETTERS, vol. 43, no. 12, 2002, pages 2239 - 2241, XP004344009
KITAMURA T. ET AL.: "Intramolecular cyclization to 1-phenyl-1-benzothiophenium salts by electrophilic addition of o-(phenylsulfanyl)phenylalkynes", JOURNAL OF THE CHEMICAL SOCIETY, PERKIN TRANSACTIONS 1: ORGANIC AND BIO-ORGANIC CHEMISTRY, vol. 14, 1994, pages 1907 - 1911, XP003020728
Attorney, Agent or Firm:
TANAI, Sumio et al. (Yaesu Chuo-ku Tokyo, 53, JP)
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