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Title:
COMPOUND, RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING RESIN
Document Type and Number:
WIPO Patent Application WO/2019/151400
Kind Code:
A1
Abstract:
Provided is a compound represented by formula (1). (In formula (1), A is a group containing a heteroatom, R1 is a C1-30 2n-valent group which may have a substituent, R2-R5 are each independently a C1-30 linear, branched, or cyclic alkyl group which may have a substituent, a C6-30 aryl group which may have a substituent, a C2-30 alkenyl group which may have a substituent, a C2-30 alkynyl group which may have a substituent, a C1-30 alkoxy group which may have a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociative group, a thiol group, or a hydroxy group, the alkyl group, the aryl group, the alkenyl group, and the alkoxy group may contain an ether bond, a ketone bond, or an ester bond, at least one among R4 and/or at least one among R5 is a hydroxy group and/or a thiol group, m2 and m3 are each independently an integer of 0-8, m4 and m5 are each independently an integer of 0-9, n is an integer of 1-4, and P2-P5 are each independently an integer of 0-2.)

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Inventors:
MAKINOSHIMA TAKASHI (JP)
HORIUCHI JUNYA (JP)
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2019/003400
Publication Date:
August 08, 2019
Filing Date:
January 31, 2019
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C43/295; C07C321/30; C08G4/00; G03F7/11; G03F7/20; G03F7/40; H01L21/027
Domestic Patent References:
WO2016158674A12016-10-06
WO2014185335A12014-11-20
WO2017188297A12017-11-02
WO2018101377A12018-06-07
WO2013024778A12013-02-21
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WO2015080240A12015-06-04
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Other References:
T. NAKAYAMAM. NOMURAK. HAGAM. UEDA, BULL. CHEM. SOC. JPN., vol. 71, 1998, pages 2979
SHINJI OKAZAKI ET AL.: "New Trends of Photoresists", September 2009, CMC PUBLISHING CO., LTD., pages: 211 - 259
See also references of EP 3747857A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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