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Patent Searching and Data


Title:
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/016640
Kind Code:
A1
Abstract:
Provided is a compound represented by formula (0). (0) (RY is a hydrogen atom, a C1–30 alkyl group, or a C6–30 aryl group; RZ is a C1–60 N-valent group or a single bond; and RT is an optionally-substituted C1–30 alkyl group, an optionally-substituted C6–30 aryl group, an optionally-substituted C2–30 alkenyl group, an optionally-substituted C1–30 alkoxy group, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group, a hydroxyl group, or a group in which a hydrogen atom of the hydroxyl group has been substituted with a vinylphenyl methyl–containing group (the alkyl group, aryl group, alkenyl group, and alkoxy group may include an ether bond, ketone bond, or ester bond), wherein at least one RT includes a group in which a hydrogen atom of the hydroxyl group has been substituted with a vinylphenyl methyl–containing group. X represents an oxygen atom or a sulfur atom, or is uncrosslinked; m is an integer from 0 to 9 (with at least one m being an integer from 1 to 9); N is an integer from 1 to 4; and r is an integer from 0 to 2.)

Inventors:
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2017/026530
Publication Date:
January 25, 2018
Filing Date:
July 21, 2017
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C43/215; C07C39/15; C07C43/20; C07C43/205; C07D311/78; C07D311/82; C08F12/22; C08G8/04; C08G8/20; C08G8/36; G03F7/031; G03F7/11; G03F7/26; H01L21/30
Foreign References:
JP2007025275A2007-02-01
JP2005300650A2005-10-27
JP2005274625A2005-10-06
JP2003043687A2003-02-13
JP2010072389A2010-04-02
JP2014174180A2014-09-22
JPS6442447A1989-02-14
JPH03163039A1991-07-15
JPS6465110A1989-03-10
JPH01503238A1989-11-02
Other References:
BIOMACROMOLECULES, vol. 12, 2011, pages 4386 - 4391
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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