Title:
CROSSLINKED POLYMER FOR RESIST
Document Type and Number:
WIPO Patent Application WO/2021/065982
Kind Code:
A1
Abstract:
[Problem] To provide a crosslinked polymer for high-sensitivity lithography. [Solution] This crosslinked polymer for resists, which changes in solubility in developing solutions by the action of an acid, contains phenolic hydroxyl groups, at least some of which have a structure formed by protection with a group represented by formula (1) (wherein R1 represents an alkyl group having 1-5 carbon atoms, n is an integer of 1-5, and * indicates the site of bonding to the residue formed by removing the hydrogen atom from the phenolic hydroxyl group) and at least some of which have been protected with a group represented by formula (2) (wherein R2 represents either a divalent saturated hydrocarbon group having 2-17 carbon atoms and optionally including an aliphatic cyclic group or a divalent hydrocarbon group having 6-17 carbon atoms and including an aromatic ring and * indicates the site of bonding to the residue formed by removing the hydrogen atom from the phenolic hydroxyl group) to make the polymer have a structure in which polymer chains have been crosslinked to one another.
Inventors:
MASUKAWA TOMOHIRO (JP)
NOJIMA MASATAKA (JP)
NOJIMA MASATAKA (JP)
Application Number:
PCT/JP2020/037078
Publication Date:
April 08, 2021
Filing Date:
September 30, 2020
Export Citation:
Assignee:
MARUZEN PETROCHEM CO LTD (JP)
International Classes:
C08F8/00; C08G8/36; G03F7/039
Foreign References:
| JP2000066400A | 2000-03-03 | |||
| JPH11190904A | 1999-07-13 | |||
| JP2008046594A | 2008-02-28 | |||
| JP2009080162A | 2009-04-16 |
Attorney, Agent or Firm:
NAKAMURA Yukitaka et al. (JP)
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