Title:
DEPOSITION CONTROL APPARATUS AND DISPLAY MANUFACTURING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2021/201436
Kind Code:
A1
Abstract:
A deposition control apparatus for effectively measuring a deposition rate and a display manufacturing method using same are provided. A deposition control apparatus according to several embodiments comprises: a first deposition source for spraying a deposition material along a first spray path; a second deposition source for spraying the deposition material along a second spray path; a deposition sensor for measuring the deposition thickness of the deposition material; and a first deposition measurement location control mechanism including a first opening part and a second opening part, wherein the first deposition measurement location control mechanism is moved so that the first spray path meets the deposition sensor by passing through the first opening part.
Inventors:
MOON IL KWON (KR)
HAN SUNG KWAN (KR)
KIM HEE CHEOL (KR)
HWANG BYUNG CHUN (KR)
LEE SUNG HEE (KR)
CHA SU YOUNG (KR)
HAN SUNG KWAN (KR)
KIM HEE CHEOL (KR)
HWANG BYUNG CHUN (KR)
LEE SUNG HEE (KR)
CHA SU YOUNG (KR)
Application Number:
PCT/KR2021/002249
Publication Date:
October 07, 2021
Filing Date:
February 23, 2021
Export Citation:
Assignee:
ALPHA PLUS CO LTD (KR)
International Classes:
C23C14/54; C23C14/24; G05B11/42; H01L51/00; H01L51/56
Foreign References:
| KR102002849B1 | 2019-07-24 | |||
| KR20190036661A | 2019-04-05 | |||
| KR20050076799A | 2005-07-28 | |||
| KR100684739B1 | 2007-02-20 | |||
| KR102092251B1 | 2020-03-23 |
Attorney, Agent or Firm:
KASAN IP & LAW FIRM (KR)
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