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Patent Searching and Data


Title:
DEPOSITION MASK AND METHOD FOR MANUFACTURING DEPOSITION MASK
Document Type and Number:
WIPO Patent Application WO/2019/082739
Kind Code:
A1
Abstract:
[Problem] To suppress misalignment of through-holes. [Solution] This deposition mask is provided with: an effective part in which a plurality of through-holes are provided; and an outer frame part surrounding the effective part. The effective part comprises: an outer circumferential region that contacts the outer frame part; and a central region surrounded by the outer circumferential region and having a thickness greater than that of the outer circumferential region.

Inventors:
MIYATANI ISAO (JP)
AOKI DAIGO (JP)
USHIKUSA MASATO (JP)
MURATA YOSHINORI (JP)
OKAMOTO HIDEYUKI (JP)
Application Number:
PCT/JP2018/038495
Publication Date:
May 02, 2019
Filing Date:
October 16, 2018
Export Citation:
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Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
C23C14/04; C25D1/00; C25D1/10; H01L51/50; H05B33/10
Foreign References:
JP2005146361A2005-06-09
JP2010065247A2010-03-25
JP2016148112A2016-08-18
JP2001234385A2001-08-31
JP2001234385A2001-08-31
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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