Title:
DEVICE AND METHOD FOR CONTROLLING IMPEDANCE MATCHING FOR VERY HIGH FREQUENCY TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/009477
Kind Code:
A1
Abstract:
The present invention relates to a device and method for controlling impedance matching for a very high frequency treatment device and, more particularly, to a device for controlling impedance matching for a very high frequency treatment device, wherein the device for controlling impedance matching is provided in a very high frequency treatment device comprising a very high frequency emitter for emitting a very high frequency on the skin, and comprises a first variable capacitor for measuring impedance within the very high frequency treatment device and a second variable capacitor for measuring impedance within the body of a person receiving treatment. The present invention enables impedance matching between impedance within a very high frequency treatment device and impedance within the body of a person receiving treatment, and thus can efficiently transfer energy to the skin when a very high frequency treatment is performed, and stably maintain an output of a very high frequency.
Inventors:
YUN JEONG SUB (KR)
KIM WON KY (KR)
KIM MYOUNG SUN (KR)
JEON SE HOON (KR)
KIM WON KY (KR)
KIM MYOUNG SUN (KR)
JEON SE HOON (KR)
Application Number:
PCT/KR2017/014065
Publication Date:
January 10, 2019
Filing Date:
December 04, 2017
Export Citation:
Assignee:
DAEYANG MEDICAL CO LTD (KR)
International Classes:
A61N1/08; A61N1/06; A61N1/40; A61N7/00; A61N7/02
Foreign References:
| JP2008104517A | 2008-05-08 | |||
| JP5708443B2 | 2015-04-30 | |||
| JP2002177404A | 2002-06-25 | |||
| KR20150022735A | 2015-03-04 | |||
| US20040044386A1 | 2004-03-04 |
Attorney, Agent or Firm:
CHOI, Ho Suk (KR)
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