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Patent Searching and Data


Title:
DIAZORESIN, PHOTORESIST COMPOSITION AND PREPARATION METHOD OF PHOTORESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/110051
Kind Code:
A1
Abstract:
Provided are a photoresist composition comprising a diazoresin and a preparation method of the photoresist composition, which is to solve the problems that in the prior art, because of poor thermal stability of a diazoresin, the storage period of the diazoresin is short, and due to a short storage period of photo-sensitive resist made of the diazoresin, the diazoresin cannot be used in an LCD photoresist. With regard to the diazoresin, the photoresist composition and the preparation method of the photoresist composition provided by the present invention, because of the good thermal stability of a diazoresin, when the diazoresin is used in a negativity photoresist, the capacity of dry etching resistance is high, and the resolution ratio is also high; meanwhile, during the exposure process, partial diazoresin can be cross-linked with hydrogen bonds on the surface of an SiO or SiON film capable of forming a barrier layer or a passivation layer, so that the adhesive force between the photoresist and the film layer is increased; the photoresist will not shed in the developing process, and accordingly the technology process in which, before masking, a tackifier needed to be used for increasing the adhesive force between the photoresist and the surface of the SiO or SiON film is omitted.

Inventors:
WANG JIANGUO (CN)
Application Number:
PCT/CN2015/081526
Publication Date:
July 14, 2016
Filing Date:
June 16, 2015
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
International Classes:
C08G16/04; C07C245/20; G03F7/004; G03F7/021
Foreign References:
CN102096323A2011-06-15
CN102081306A2011-06-01
CN104262193A2015-01-07
CN1065143A1992-10-07
CN104530342A2015-04-22
Other References:
WANG, RENXIAN: "Synthesis and Characterization of N-Methyl-2-nitrodiphenylamine-4-diazonium Salt and Its Diazoresin", JOURNAL OF APPLIED POLYMER SCIENCE, vol. 74, no. 1, 23 July 1999 (1999-07-23), pages 189 - 193, XP055366177
See also references of EP 3081581A4
Attorney, Agent or Firm:
TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
北京天昊联合知识产权代理有限公司 (CN)
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