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Title:
DI(METH)ACRYLATE, PHOTOCURABLE RESIN COMPOSITION, AND PHOTOCURABLE RESIN COMPOSITION FOR ADHESIVE
Document Type and Number:
WIPO Patent Application WO/2023/282117
Kind Code:
A1
Abstract:
The present invention provides: a photocurable resin composition having a low viscosity before curing, having an excellent low-temperature storability, and producing, after curing, a film that has excellent water resistance, bending resistance, and transparency; and a photocurable resin composition for an adhesive that has excellent applicability with respect to uneven surfaces and that makes it possible to form a cured product (adhesive layer) having excellent transparency, adhesiveness with respect to an uneven substrate, and flexibility when bent, as well as a high water-resistant adhesiveness. The present invention provides a di(meth)acrylate represented by general formula (1) (where R represents a hydrogen atom or a methyl group, and n represents an average number of added moles of oxytrimethylene group and is a real number of 5-90). The present invention also provides a photocurable resin composition characterized by containing component (A): 30-100 mass% of said di(meth)acrylate and component (B1): 0-70 mass% of urethane (meth)acrylate (B1), relative to 100 mass% of all monomer components in the composition. The present invention also provides a photocurable resin composition for an adhesive characterized by containing component (A): said di(meth)acrylate, component (B): a polymerizable oligomer (B) having two or more (meth)acryloyl groups in one molecule, and component (C1): a monofunctional (meth)acrylate monomer (C1), the amount of component (A) contained being 1-50 mass%, the amount of component (B) contained being 15-98 mass%, and the amount of component (C1) contained being 1-35 mass%, relative to a total amount of 100% of components (A), (B), and (C1).

Inventors:
NAGASAWA ATSUSHI (JP)
YAMADA AYAKA (JP)
Application Number:
PCT/JP2022/025666
Publication Date:
January 12, 2023
Filing Date:
June 28, 2022
Export Citation:
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Assignee:
NOF CORP (JP)
International Classes:
C08G65/332; C07C69/602; C08F2/46; C08F290/06; C09J4/02; C09J175/14
Domestic Patent References:
WO2021079679A12021-04-29
WO2009056955A12009-05-07
Foreign References:
JP2013531266A2013-08-01
KR20100005463A2010-01-15
JP2018024764A2018-02-15
JP2016166360A2016-09-15
JP2021111779A2021-08-02
JP2021126067A2021-09-02
Other References:
HONGBO LIN, YUANLONG WANG, YANCHANG GAN, HONGHAO HOU, JIE YIN, XUESONG JIANG: "Simultaneous Formation of a Self-Wrinkled Surface and Silver Nanoparticles on a Functional Photocuring Coating", LANGMUIR, vol. 31, no. 43, 3 November 2015 (2015-11-03), US , pages 11800 - 11808, XP055582599, ISSN: 0743-7463, DOI: 10.1021/acs.langmuir.5b03484
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TAYLOR MICHAEL, URQUHART ANDREW J., ANDERSON DANIEL G., LANGER ROBERT, DAVIES MARTYN C., ALEXANDER MORGAN R.: "Partial least squares regression as a powerful tool for investigating large combinatorial polymer libraries", SURFACE AND INTERFACE ANALYSIS, vol. 41, no. 2, 1 February 2009 (2009-02-01), GB , pages 127 - 135, XP093020663, ISSN: 0142-2421, DOI: 10.1002/sia.2969
ANDERSON D G, LYNN D M, LANGER R: "Semi-automated synthesis and screening of a large library of degradable cationic polymers for gene delivery.", ANGEWANDTE CHEMIE INTERNATIONAL EDITION, vol. 42, no. 27, 14 July 2003 (2003-07-14), pages 3153 - 3158, XP001196690, ISSN: 1433-7851, DOI: 10.1002/anie.200351244
Attorney, Agent or Firm:
TAKASHIMA, Hajime (JP)
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