Title:
DOUBLE INSPECTION OF RETICLE OR WAFER
Document Type and Number:
WIPO Patent Application WO2006019446
Kind Code:
A3
Abstract:
During mask or reticle inspection, each region is scanned at least twice, using an overlap between each pair of consecutive frames. System contamination and camera blemishes have approximately constant frame coordinates, while mask defects have constant reticle coordinates, but inconstant scan frame coordinates. True defects are detected at different coordinates in consecutive frames with a known displacement therebetween.
Inventors:
NAFTALI RON (IL)
MADMON YOCHANAN (IL)
SPEYER GAVRIEL (IL)
BOIMAN OREN (IL)
MADMON YOCHANAN (IL)
SPEYER GAVRIEL (IL)
BOIMAN OREN (IL)
Application Number:
PCT/US2005/015932
Publication Date:
May 04, 2006
Filing Date:
May 04, 2005
Export Citation:
Assignee:
APPLIED MATERIALS ISRAEL LTD (IL)
APPLIED MATERIALS INC (US)
NAFTALI RON (IL)
MADMON YOCHANAN (IL)
SPEYER GAVRIEL (IL)
BOIMAN OREN (IL)
APPLIED MATERIALS INC (US)
NAFTALI RON (IL)
MADMON YOCHANAN (IL)
SPEYER GAVRIEL (IL)
BOIMAN OREN (IL)
International Classes:
G01N21/956; G03F1/00
Domestic Patent References:
| WO2005010510A1 | 2005-02-03 | |||
| WO2005026706A1 | 2005-03-24 |
Foreign References:
| US6081325A | 2000-06-27 | |||
| US6122397A | 2000-09-19 |
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