Title:
ELECTRODE SUPPORT, SUPPORTING STRUCTURE, SUPPORT, FILM COATING APPARATUS, AND APPLICATION
Document Type and Number:
WIPO Patent Application WO/2021/109424
Kind Code:
A1
Abstract:
The present invention provides an electrode support, a supporting mechanism, a support, a film coating apparatus, and an application. The electrode support is applied to the film coating apparatus. The film coating apparatus allows coating of at least one workpiece to be coated. The film coating apparatus comprises a reaction chamber and a pulse power supply; the pulse power supply is used for providing a pulse electric field in the reaction chamber. The electrode support comprises support members arranged in multiple layers; the support member of each layer is separately retained at a preset spacing; at least one layer of the support member is conductively connected to the pulse power supply to serve as a negative electrode of the pulse power supply. The electrode support can uniformly load the workpiece to be coated and can be used as an electrode, and wiring between the electrode support and an external power supply is simple.
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Inventors:
ZONG JIAN (CN)
KANG BIXIAN (CN)
LI FUXING (CN)
FENG GUOMAN (CN)
KANG BIXIAN (CN)
LI FUXING (CN)
FENG GUOMAN (CN)
Application Number:
PCT/CN2020/086525
Publication Date:
June 10, 2021
Filing Date:
April 24, 2020
Export Citation:
Assignee:
JIANGSU FAVORED NANOTECHNOLOGY CO LTD (CN)
International Classes:
C23C16/455; C23C16/458; C23C16/509; C23C16/515
Domestic Patent References:
| WO2011099205A1 | 2011-08-18 |
Foreign References:
| CN110965049A | 2020-04-07 | |||
| CN110983296A | 2020-04-10 | |||
| CN206948696U | 2018-01-30 | |||
| CN102804932A | 2012-11-28 | |||
| CN207727149U | 2018-08-14 | |||
| CN1397151A | 2003-02-12 | |||
| US20090239385A1 | 2009-09-24 |
Attorney, Agent or Firm:
NINGBO RAYMOND IP AGENCY FIRM (CN)
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