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Patent Searching and Data


Title:
ELECTRON BEAM EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2006/123447
Kind Code:
A1
Abstract:
An electron beam exposure device has a projector (8) for producing a two-dimensional light pattern (13); a microchannel plate (11) for producing an electron beam array that is based on the incident light pattern (13) and amplifying the electron beam array to emit a resultant amplified electron beam array (14); an electron beam lens section (12) for focusing the amplified electron beam array (14). The electron beam exposure device can produce a semiconductor element that is more finely processed for improved performance by using exposure with an electron beam. Further, the electron beam exposure device can reduce costs of the production because the exposure can collectively made by the two-dimensional pattern.

Inventors:
KIMURA KENJIRO
KOBAYASHI KEI
YAMADA HIROFUMI
MATSUSHIGE KAZUMI
Application Number:
PCT/JP2005/021299
Publication Date:
November 23, 2006
Filing Date:
November 18, 2005
Export Citation:
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Assignee:
UNIV KYOTO (JP)
KIMURA KENJIRO
KOBAYASHI KEI
YAMADA HIROFUMI
MATSUSHIGE KAZUMI
International Classes:
H01L21/027; G03F7/20; H01J37/305; H01J43/24
Foreign References:
JPH1197331A1999-04-09
JPS5485665A1979-07-07
JP2004304135A2004-10-28
JPH06236842A1994-08-23
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (2-6 Tenjinbashi 2-chome Kita, Kita-k, Osaka-shi Osaka 41, JP)
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