Title:
ELECTRON BEAM IRRADIATION DEVICE AND ELECTRON BEAM IRRADIATION METHOD
Document Type and Number:
WIPO Patent Application WO/2017/119180
Kind Code:
A1
Abstract:
An electron beam irradiation device is provided with: an electron beam generation unit for generating an electron beam; a housing part that forms a vacuum space for accommodating the electron beam generation unit; an electron beam guide part that has a proximal end connected to the housing part, is in communication with the vacuum space, has a distal end that is provided with an elongated cylindrical member that can be inserted into the inside of a container via an opening in the container, and has the electron beam generated by the electron beam generation unit pass therein; an electron beam emission window that is provided on the distal end of the electron beam guide part and through which the electron beam is emitted; and an adjustment unit for adjusting the path of the electron beam in the electron beam guide part. The adjustment unit is disposed outside the vacuum space on the proximal side of the electron beam guide part.
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Inventors:
MATSUMURA TATSUYA (JP)
Application Number:
PCT/JP2016/082464
Publication Date:
July 13, 2017
Filing Date:
November 01, 2016
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
G21K5/04; A61L2/08; B01J19/12; B65B55/08; B65B55/04
Domestic Patent References:
| WO2014175065A1 | 2014-10-30 |
Foreign References:
| JP2008128978A | 2008-06-05 | |||
| JP2014134548A | 2014-07-24 | |||
| JP2013129453A | 2013-07-04 | |||
| JP2007242556A | 2007-09-20 | |||
| JP2012055556A | 2012-03-22 | |||
| JP5774156B2 | 2015-09-02 |
Other References:
See also references of EP 3401927A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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