Title:
ELECTRON MULTIPLIER
Document Type and Number:
WIPO Patent Application WO/2019/003566
Kind Code:
A1
Abstract:
This electron multiplier is provided with a structure for suppressing and stabilizing resistance value fluctuations over a wider temperature range. In this electron multiplier, a resist layer, held between a substrate and a secondary electron emission layer formed from an insulating material, is configured from a single metal layer comprising multiple metal lumps which are formed from a metal material having a resistance value with a positive temperature characteristic and which, in a state adjacent to each other with a portion of the first insulating material interposed therebetween, are arranged two-dimensionally on a layer formation surface that coincides with or is substantially parallel to a channel formation surface of the substrate.
Inventors:
MASUKO DAICHI (JP)
HAMANA YASUMASA (JP)
NISHIMURA HAJIME (JP)
WATANABE HIROYUKI (JP)
HAMANA YASUMASA (JP)
NISHIMURA HAJIME (JP)
WATANABE HIROYUKI (JP)
Application Number:
PCT/JP2018/015081
Publication Date:
January 03, 2019
Filing Date:
April 10, 2018
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
International Classes:
H01J43/24
Foreign References:
| JP2011525294A | 2011-09-15 | |||
| US8237129B2 | 2012-08-07 | |||
| US9105379B2 | 2015-08-11 |
Other References:
See also references of EP 3648139A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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