Title:
ELEVATOR LANDING SILL DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/245899
Kind Code:
A1
Abstract:
Provided is an elevator landing sill device that can easily accommodate comparatively large measurement errors in a building in the height direction and in the depth direction of the hoistway. The elevator landing sill device comprises a landing sill that guides the opening and closing of a landing door, a fixture that is fixed to a hoistway wall and to the upper portion of which the landing sill is mounted, and a partition plate that covers the gap between the landing sill and the hoistway wall, said partition plate comprising: a low rigidity member that has one end wedged between the landing sill and the fixture and the other end extending to the hoistway wall side; and a high rigidity member that has one end overlapping the other end of the low rigidity member and the other end fixed to the top face of the hoistway wall.
More Like This:
Inventors:
TAKAHARA YU (JP)
ISHITSUKA SHINSUKE (JP)
KIMURA YUTA (JP)
ISHITSUKA SHINSUKE (JP)
KIMURA YUTA (JP)
Application Number:
PCT/JP2019/022124
Publication Date:
December 10, 2020
Filing Date:
June 04, 2019
Export Citation:
Assignee:
HITACHI LTD (JP)
International Classes:
B66B13/30
Foreign References:
| JPS59199981A | 1984-11-13 | |||
| JPS595024Y2 | 1984-02-15 | |||
| JPS5526267B2 | 1980-07-11 | |||
| JPS4718277U | 1972-10-31 | |||
| JPS547649Y2 | 1979-04-10 | |||
| JPH1045361A | 1998-02-17 | |||
| KR20060025712A | 2006-03-22 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
Download PDF: