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Title:
ENHANCED FABRIC COMPRISING SUBSTRATES AND PROCESS TO PROVIDE SAME
Document Type and Number:
WIPO Patent Application WO2001057304
Kind Code:
A3
Abstract:
The present invention relates to substrate comprising fabric, the substrate treated with a composition comprising: a) formaldehyde; b) polyethylene glycol having a molecular weight of from about 700 gm/mol to about 2500 gm/mol; and c) an acid catalyst;wherein the treated substrate has at least three enhanced fabric benefits, said benefits selected from the group consisting of: i) durable press; ii) hand feel; iii) anti-abrasion; iv) anti-shrinkage; andv) anti-yellowing. The present invention further relates to a system and a process for providing a substrate having the above described enhanced fabric benefits.

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Inventors:
GARDNER ROBB RICHARD
LITTIG JANET SUE
SIVIK MARK ROBERT
Application Number:
PCT/US2001/003921
Publication Date:
December 20, 2001
Filing Date:
February 07, 2001
Export Citation:
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Assignee:
PROCTER & GAMBLE (US)
International Classes:
D06M13/127; D06M15/53; D06M15/39; (IPC1-7): D06M13/127; D06M15/53
Domestic Patent References:
WO1987007854A11987-12-30
WO1999058758A11999-11-18
Foreign References:
US2785949A1957-03-19
Other References:
PATENT ABSTRACTS OF JAPAN vol. 017, no. 376 (C - 1084) 15 July 1993 (1993-07-15)
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