Title:
EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/075355
Kind Code:
A1
Abstract:
An exposure device 1 divides a region to be exposed 14 into a first region to be exposed 14A and a second region to be exposed 14B, and transfers mask patterns 17A, 17B to a substrate 10 by a first photomask 11A corresponding to the first region to be exposed 14A and a second photomask 11B corresponding to the second region to be exposed 14B. The exposure device 1 comprises: an alignment mechanism 28 which has a first stage 25 and a second stage 26 that are connected in series, and performs relative alignment between the substrate 10 and the photomasks 11A, 11B; and exposure light irradiation mechanisms 30A, 30B which switchingly irradiate the first photomask 11A and the second photomask 11B with light emitted from a light source 45 as exposure light 50. The exposure device 1 makes it possible to reduce cost for photomasks, and highly accurately transfer mask patterns to a large-sized substrate.
Inventors:
KATO KAZUHIKO (JP)
HANYU SHINICHI (JP)
HANYU SHINICHI (JP)
Application Number:
PCT/JP2020/038204
Publication Date:
April 22, 2021
Filing Date:
October 08, 2020
Export Citation:
Assignee:
BEAC CO LTD (JP)
International Classes:
G03F9/00; G03F7/20
Foreign References:
| JP2004094142A | 2004-03-25 | |||
| JP2007178770A | 2007-07-12 | |||
| JP2003228169A | 2003-08-15 | |||
| JP2003045918A | 2003-02-14 | |||
| JP2010176121A | 2010-08-12 | |||
| JP2000214595A | 2000-08-04 | |||
| JP2012103366A | 2012-05-31 | |||
| JP2010282203A | 2010-12-16 | |||
| JP2015049356A | 2015-03-16 |
Attorney, Agent or Firm:
MEBUKI IP LAW FIRM et al. (JP)
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