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Patent Searching and Data


Title:
EXPOSURE EQUIPMENT AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2019/029601
Kind Code:
A1
Abstract:
Exposure equipment and an exposure method, the exposure equipment comprising a control system, an optical source system, and a plurality of illumination systems and projection objective lenses (30). The optical source system is used to emit multiple first illuminating incident beams to the plurality of illumination systems, each illumination system comprises a variable attenuator (20) and a branch energy detector (51) used to measure the illuminance of the second illuminating beam generated by the corresponding illumination system and to feed back the illuminance value to the control system wherein the control system, via control of the variable attenuator of each illumination system, adjusts the illuminance of each second illumination beam. The exposure equipment and exposure method can boost exposure performance, with accurate and rapid energy adjustment, achieving precise control and boosting accuracy of exposures.

Inventors:
QIAN JUN (CN)
ZHAI SIHONG (CN)
Application Number:
PCT/CN2018/099543
Publication Date:
February 14, 2019
Filing Date:
August 09, 2018
Export Citation:
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Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
G03F7/20
Foreign References:
CN1432874A2003-07-30
CN1182486A1998-05-20
CN107966882A2018-04-27
CN108121163A2018-06-05
CN202472238U2012-10-03
US5617181A1997-04-01
US4947030A1990-08-07
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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