Title:
EXPOSURE PELLICLE CAPABLE OF ADJUSTING ATMOSPHERIC PRESSURE AT HIGH SPEED
Document Type and Number:
WIPO Patent Application WO/2023/027051
Kind Code:
A1
Abstract:
[Problem] To achieve high performance of a filter attached to a ventilation port provided through a pellicle frame so as to satisfy strict use conditions required particularly for EUV exposure. [Solution] A pellicle according to the present invention comprises: a pellicle frame; an extremely thin pellicle film provided on the upper end surface of the pellicle frame; a ventilation port provided in the pellicle frame; and a filter that covers the ventilation port. The filter is composed of: a sheet, a part or the entirety of which is composed of nanofibers and/or carbon nanotubes; and a support that has an opening for supporting the sheet.
Inventors:
KUBOTA YOSHIHIRO (JP)
YANASE YU (JP)
TAKEUCHI AYANO (JP)
NISHIMURA AKINORI (JP)
NOZAKI SATOSHI (JP)
YANASE YU (JP)
TAKEUCHI AYANO (JP)
NISHIMURA AKINORI (JP)
NOZAKI SATOSHI (JP)
Application Number:
PCT/JP2022/031648
Publication Date:
March 02, 2023
Filing Date:
August 23, 2022
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
G03F1/62
Domestic Patent References:
| WO2019240166A1 | 2019-12-19 |
Foreign References:
| JP2016191902A | 2016-11-10 | |||
| JPH08106156A | 1996-04-23 | |||
| JP2016176150A | 2016-10-06 | |||
| JP2021013466A | 2021-02-12 | |||
| JP2019204132A | 2019-11-28 | |||
| JP2005268464A | 2005-09-29 |
Other References:
ELECTRONIC MATERIALS, July 1997 (1997-07-01), pages 103
Attorney, Agent or Firm:
SHIMAZAKI Eiichiro (JP)
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