Title:
EXPOSURE SYSTEM, METHOD FOR CREATING LASER CONTROL PARAMETER, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/186696
Kind Code:
A1
Abstract:
An exposure system according to an aspect of the present disclosure is provided with: a laser device for outputting pulsed laser light; an illumination optical system for guiding the pulsed laser light to a reticle; a reticle stage for moving the reticle; and a processor for controlling the output of the pulsed laser light from the laser device and the movement of the reticle by the reticle stage, and performs scanning exposure on a semiconductor substrate by irradiating the reticle with the pulsed laser light. The reticle has a first region and a second region, and the processor indicates to the laser device the values of control parameters of the pulsed laser light corresponding to the first region and the second region on the basis of proximity effect characteristics corresponding to the respective regions such that the pulsed laser light with which the differences of the proximity effect characteristics in the respective regions from a reference proximity effect characteristic fall within an allowable range is outputted.
Inventors:
FUJII KOICHI (JP)
WAKABAYASHI OSAMU (JP)
WAKABAYASHI OSAMU (JP)
Application Number:
PCT/JP2020/012413
Publication Date:
September 23, 2021
Filing Date:
March 19, 2020
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20; H01S3/00
Domestic Patent References:
| WO2007004567A1 | 2007-01-11 | |||
| WO2018105082A1 | 2018-06-14 |
Foreign References:
| JP2007142052A | 2007-06-07 | |||
| JP2006179937A | 2006-07-06 | |||
| JP2007081393A | 2007-03-29 |
Attorney, Agent or Firm:
MATSUURA, Kenzo (JP)
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