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Patent Searching and Data


Title:
EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND METHOD FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/058430
Kind Code:
A1
Abstract:
This extreme ultraviolet light generation device is provided with: a chamber; an EUV light collecting mirror that is situated inside the chamber, that has a reflecting surface for establishing a first focal point and a second focal point, and that is configured to cause the reflecting surface and the second focal point to be positioned across a first plane that includes the first focal point and that is perpendicular to a first straight line passing through the first and second focal points; one or more magnets which are for generating magnetic fields at the first focal point and in the periphery thereof; a first gas supply part which is configured to supply a first gas into the chamber and which is opened in the vicinity of the outer periphery of the reflecting surface so as to deliver the first gas to the reflecting surface; a second gas supply part which is configured to supply a second gas into the chamber and which is opened at a position between the first plane and the second focal point; and an exhaust device which is configured to exhaust gas from inside the chamber and which is opened at a location between the first focal point and at least one of the magnets.

Inventors:
UEDA ATSUSHI (JP)
SAITO TAKASHI (JP)
Application Number:
PCT/JP2017/033747
Publication Date:
March 28, 2019
Filing Date:
September 19, 2017
Export Citation:
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Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20; H05G2/00
Foreign References:
JP2007273239A2007-10-18
JP2009544148A2009-12-10
JP2012169580A2012-09-06
JP2009253032A2009-10-29
Attorney, Agent or Firm:
HOSAKA Nobuhisa (JP)
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