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Title:
FE-PT-BN-BASED SPUTTERING TARGET AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/010019
Kind Code:
A1
Abstract:
The present invention adopts a different approach from conventional methods in order to solve the problem of particle generation from a Fe-Pt-BN-based sputtering target having a high relative density. This Fe-Pt-BN-based sputtering target has a relative density of 90% or more and a Vickers hardness of 150 or less, and is capable of minimizing the number of particles generated therefrom during magnetron sputtering.

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Inventors:
NISHIURA MASAHIRO (JP)
YAMAMOTO TAKAMICHI (JP)
KUROSE KENTA (JP)
KOBAYASHI HIRONORI (JP)
MIYASHITA TAKANOBU (JP)
Application Number:
PCT/JP2020/020307
Publication Date:
January 21, 2021
Filing Date:
May 22, 2020
Export Citation:
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Assignee:
TANAKA PRECIOUS METAL IND (JP)
International Classes:
B22F3/00; C23C14/34; C22C1/05; C22C5/04; C22C30/00; C22C32/00
Domestic Patent References:
WO2018047978A12018-03-15
WO2014064995A12014-05-01
WO2016047578A12016-03-31
WO2016047236A12016-03-31
WO2014132746A12014-09-04
WO2019181823A12019-09-26
Attorney, Agent or Firm:
YAMAMOTO, Osamu et al. (JP)
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