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Patent Searching and Data


Title:
FIELD EMISSION ELECTRODE AND PREPARATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/114379
Kind Code:
A1
Abstract:
Disclosed is a field emission electrode, comprising a substrate and a metal electrode layer formed on the substrate, wherein the metal electrode layer is provided with multiple indium columns arranged in an array, with the top face of each indium column being provided with multiple nanowires. The preparation method for the field emission electrode comprises: S10, providing a substrate, and depositing and forming a metal electrode layer on the substrate; S20, preparing, on the metal electrode layer, a photoresist mask with a hole array; S30, depositing indium material on the photoresist mask, and stripping off the photoresist mask to obtain multiple indium columns arranged in an array; and S40, placing the prepared substrate with the indium columns in a reaction furnace to grow multiple nanowires on the top face of each indium column. The field emission electrode of the present invention has an excellent field emission performance, the preparation process therefor is simple, the nanowires can grow under low temperature and low pressure conditions, and the growth conditions are simple, mild and easy to control, thereby effectively improving the quality of the product and reducing the production cost.

Inventors:
ZHANG DAOSHU (CN)
CHEN MING (CN)
HONG XUDA (CN)
FENG YE (CN)
ZHONG GUOHUA (CN)
LI WENJIE (CN)
YANG CHUNLEI (CN)
Application Number:
PCT/CN2019/122610
Publication Date:
June 11, 2020
Filing Date:
December 03, 2019
Export Citation:
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Assignee:
SHENZHEN INST ADV TECH (CN)
International Classes:
H01J1/304
Foreign References:
CN109585238A2019-04-05
US20090068411A12009-03-12
CN1843932A2006-10-11
CN1794403A2006-06-28
CN103198991A2013-07-10
CN102884605A2013-01-16
Attorney, Agent or Firm:
MING & YUE INTELLECTUAL PROPERTY LAW FIRM (CN)
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