Title:
FILM FORMATION METHOD AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/138331
Kind Code:
A1
Abstract:
A film formation method whereby a film comprising a curable composition is formed. The film formation method includes: an arrangement step in which the curable composition is arranged upon an undercoat layer of a substrate that has a base material and the undercoat layer disposed upon the base material; a contact step in which, after the arrangement step, the curable composition and a mold are caused to contact; a curing step in which, after the contact step, the curable composition is cured; and a separation step in which, after the curing step, the curable composition and the mold are separated. In the contact step, a gas is present that fills a gap between the undercoat layer and the mold. The solubility coefficient for the gas, relative to the undercoat layer, is 0.5 kg/m3·atm to 10 kg/m3·atm.
Inventors:
ITO YUTO (JP)
ITO TOSHIKI (JP)
KAWATA ISAO (JP)
ITO TOSHIKI (JP)
KAWATA ISAO (JP)
Application Number:
PCT/JP2021/046063
Publication Date:
June 30, 2022
Filing Date:
December 14, 2021
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
H01L21/027; B29C59/02
Foreign References:
| JP2012507140A | 2012-03-22 | |||
| JP2012000992A | 2012-01-05 | |||
| JP2011041938A | 2011-03-03 | |||
| JP2011505270A | 2011-02-24 | |||
| JP2003222592A | 2003-08-08 | |||
| JP5065058B2 | 2012-10-31 | |||
| JP2016162862A | 2016-09-05 | |||
| JP5827180B2 | 2015-12-02 | |||
| JP2019140394A | 2019-08-22 | |||
| JP2009503139A | 2009-01-29 | |||
| JP2020212772A | ||||
| JP2021198701A |
Other References:
N. SHIRAISHI, INT. J. MICROGRAVITY SCI., no. 31, 2014, pages S5 - S12
PROC. SPIE, 2020, pages 11324 - 11
SUSUMU OKAZAKI: "Basis of Computer Simulation", KAGAKUDOJIN, 2000
B. H. BESLERK. M. MERZ JR.P. A. KOLLMAN, J. COMP. CHEM., vol. 11, 1990, pages 431
U. C. SINGHP. A. KOLLMAN, J. COMP. CHEM., vol. 5, 1984, pages 129
M.BEARPARKJ.J.HEYDE.BROTHERSK.N.KUDINVN.STAROVEROVT.KEITHR.KOBAYASHIJ.NORMANDK.RAGHAVACHARIA.RENDELL, WALLINGFORD CT, 2010
PROC. SPIE, 2020, pages 11324 - 11
SUSUMU OKAZAKI: "Basis of Computer Simulation", KAGAKUDOJIN, 2000
B. H. BESLERK. M. MERZ JR.P. A. KOLLMAN, J. COMP. CHEM., vol. 11, 1990, pages 431
U. C. SINGHP. A. KOLLMAN, J. COMP. CHEM., vol. 5, 1984, pages 129
M.BEARPARKJ.J.HEYDE.BROTHERSK.N.KUDINVN.STAROVEROVT.KEITHR.KOBAYASHIJ.NORMANDK.RAGHAVACHARIA.RENDELL, WALLINGFORD CT, 2010
Attorney, Agent or Firm:
OHTSUKA PATENT OFFICE, P.C. (JP)
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