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Patent Searching and Data


Title:
FILTER DEVICE, PURIFICATION DEVICE, CHEMICAL SOLUTION PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/181435
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a filter device which can produce a chemical solution having excellent defect suppression performance. Another purpose of the present invention is to provide a purification device and a chemical solution production method. This filter device, for purifying a solution to be purified to obtain a chemical solution, is provided with an inlet, an outlet, a filter A, and at least one filter B different from the filter A. The filter A and the filter B are arranged in series between the inlet and the outlet, there is a flow path from the inlet to the outlet, and the filter A is selected from a group consisting of a prescribed filter A1, filter A2, and filter A3.

Inventors:
KAMIMURA TETSUYA (JP)
OMATSU TADASHI (JP)
SHIMIZU TETSUYA (JP)
TAKAHASHI SATOMI (JP)
Application Number:
PCT/JP2019/008077
Publication Date:
September 26, 2019
Filing Date:
March 01, 2019
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
B01D61/58; B01D3/00; B01D61/14; B01D65/02; B01D69/00; B01D69/10; B01D69/12; B01D71/32; B01D71/36; B01D71/82; B32B27/30; C08F236/20; C08J9/36; G03F7/16; G03F7/26; G03F7/32; H01L21/304
Domestic Patent References:
WO2018043697A12018-03-08
WO2017188209A12017-11-02
Foreign References:
JP2015521101A2015-07-27
JP2016073922A2016-05-12
JP2012522882A2012-09-27
JP2015061727A2015-04-02
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
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