Title:
FINE PARTICLE ANALYSIS DEVICE, FINE PARTICLE ANALYSIS SYSTEM, AND CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/187976
Kind Code:
A1
Abstract:
Provided is a fine particle analysis device, and to clean the inside thereof without stopping or disassembling the fine particle analysis device, the following are provided: a cyclone dust collection device (14); a primary filter (16) that is connected downstream of the cyclone dust collection device (14) and that is heated; a gas analysis device (31) that is connected to the primary filter (16); a gas piping section that connects the cyclone dust collection device (14) and the gas analysis device (31), and that has disposed therein the primary filter (16); and a cleaning gas introduction device (21) that introduces a cleaning gas downstream of the primary filter (16) in the gas piping section and/or to the cyclone dust collection device (14). The present invention is characterized in that during a cleaning mode in which at least the primary filter (16) is cleaned, the flow rate of the cleaning gas that is introduced from the cleaning gas introduction device (21) increases so as to be greater than the flow rate during an analysis mode in which fine particles are analyzed by the gas analysis device (31).
Inventors:
KUMANO SHUN (JP)
NAGANO HISASHI (JP)
ITOU TAKAHIRO (JP)
MIZUNO HIROKI (JP)
NOJIRI TATSUO (JP)
SUGIYAMA MASUYUKI (JP)
NAGANO HISASHI (JP)
ITOU TAKAHIRO (JP)
MIZUNO HIROKI (JP)
NOJIRI TATSUO (JP)
SUGIYAMA MASUYUKI (JP)
Application Number:
PCT/JP2019/008072
Publication Date:
October 03, 2019
Filing Date:
March 01, 2019
Export Citation:
Assignee:
HITACHI LTD (JP)
International Classes:
G01N1/00; B01D45/12; B04C5/14; B04C5/20; B04C5/22; B04C9/00; G01N27/60; G01N27/62
Domestic Patent References:
| WO2016027320A1 | 2016-02-25 | |||
| WO2012063796A1 | 2012-05-18 | |||
| WO2012063796A1 | 2012-05-18 | |||
| WO2016027320A1 | 2016-02-25 |
Foreign References:
| JPS51123080U | 1976-10-05 | |||
| JPH09311098A | 1997-12-02 | |||
| JP2000171357A | 2000-06-23 | |||
| JP2000346759A | 2000-12-15 | |||
| JPH0576803A | 1993-03-30 | |||
| JPH09103708A | 1997-04-22 | |||
| JPH07294393A | 1995-11-10 | |||
| JPH06129959A | 1994-05-13 | |||
| JPH0576803A | 1993-03-30 |
Other References:
See also references of EP 3779395A4
Attorney, Agent or Firm:
ISONO INTERNATIONAL PATENT OFFICE, P.C. (JP)
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