Title:
FINE PARTICLE MANUFACTURING APPARATUS AND FINE PARTICLE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/178915
Kind Code:
A1
Abstract:
Provided are a fine particle manufacturing apparatus and a fine particle manufacturing method capable of controlling the particle size of fine particles and efficiently mass-manufacturing fine particles having good evenness of particle size. This fine particle manufacturing apparatus has: a raw material supply part that supplies a raw material for manufacturing fine particles into a thermal plasma flame; a plasma torch in which the thermal plasma flame is generated and the raw material supplied by the raw material supply part is vaporized by using the thermal plasma flame so as to form a mixture in a gas phase state; and a plasma generation part that generates the thermal plasma flame inside the plasma torch. The plasma generation part has: a first coil encircling the plasma torch; a second coil encircling the plasma torch and disposed below the first coil; a first power supply part that supplies a high-frequency electric current to the first coil; and a second power supply part that supplies an amplitude-modulated high-frequency electric current to the second coil. The first coil and the second coil are arranged in the longitudinal direction of the plasma torch.
Inventors:
TANAKA YASUNORI (JP)
KODAMA NAOTO (JP)
ONDA KAZUKI (JP)
WATANABE SHU (JP)
NAKAMURA KEITAROH (JP)
SUEYASU SHIORI (JP)
KODAMA NAOTO (JP)
ONDA KAZUKI (JP)
WATANABE SHU (JP)
NAKAMURA KEITAROH (JP)
SUEYASU SHIORI (JP)
Application Number:
PCT/JP2019/008186
Publication Date:
September 10, 2020
Filing Date:
March 01, 2019
Export Citation:
Assignee:
UNIV NAT CORP KANAZAWA (JP)
NISSHIN SEIFUN GROUP INC (JP)
NISSHIN SEIFUN GROUP INC (JP)
International Classes:
B01J19/08; H05H1/30
Foreign References:
| JP2012521617A | 2012-09-13 | |||
| JP2006247446A | 2006-09-21 | |||
| JP2012055840A | 2012-03-22 | |||
| JPH06279015A | 1994-10-04 | |||
| JP2013194265A | 2013-09-30 | |||
| JP2005505906A | 2005-02-24 |
Other References:
KURAISHI, KATSUYA ET AL.: "Temperature Behavior in a Tandem Type of Modulated Induction Thermal Plasma for Materials Processings", JOURNAL OF PHYSICS: CONFERENCE SERIES, vol. 441, 13 June 2013 (2013-06-13), pages 1 - 6, XP020245978, DOI: 10.1088/1742-6596/441/1/012016
ONDA, KAZUKI ET AL.: "Synthesis Test with Large Modulation of Lower-CoilCurrent using Tandem Type of Induction Thermal Plasmas.", THE 79TH JSAP AUTUMN MEETING., 18 September 2018 (2018-09-18), pages 7 - 23
ONDA, KAZUKI ET AL.: "Numerical Study onTandem Type of Induction Thermal Plasma with Lower-Coil Current Modulation.", THE PAPERS OF TECHNICAL MEETING ON ELECTRICAL DISCHARGES, IEE JAPAN., 17 May 2018 (2018-05-17), pages 37 - 42
ONDA, KAZUKI ET AL.: "Synthesis Test with Large Modulation of Lower-CoilCurrent using Tandem Type of Induction Thermal Plasmas.", THE 79TH JSAP AUTUMN MEETING., 18 September 2018 (2018-09-18), pages 7 - 23
ONDA, KAZUKI ET AL.: "Numerical Study onTandem Type of Induction Thermal Plasma with Lower-Coil Current Modulation.", THE PAPERS OF TECHNICAL MEETING ON ELECTRICAL DISCHARGES, IEE JAPAN., 17 May 2018 (2018-05-17), pages 37 - 42
Attorney, Agent or Firm:
ITOH Hideaki (JP)
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