FLOW RATE CONTROL DEVICE AND FLOW RATE CONTROL METHOD

WIPO Patent Application WO/2021/176864

A1

Provided are a flow rate control device and a flow rate control method with which it is possible to increase the flow rate in a smooth procedure at the time of flow rate rising.　A flow rate control device (8) is provided with a control valve (6) having a valve body and a piezoelectric element for moving the valve body, and a computation processing circuit (7) that controls the operation of the control valve. The computation processing circuit is configured to, when the control valve in its closed state is opened so that gas flows at a target flow rate, receive an external instruction signal corresponding to the target flow rate, and generate, on the basis of the external instruction signal, an internal instruction signal that is output to a drive circuit that determines the voltage to be applied to the piezoelectric element. The internal instruction signal is a signal that temporally rises from zero and converges to the value of the external instruction signal, and is generated such that the slope at the time of rising and the slope just before convergence are smaller than the slope therebetween.

WO/2023/162953	CONTROL SYSTEM FOR FLYING VEHICLE
WO/2003/056402	METHOD AND DEVICE FOR AXIS CONTROL FOR MACHINE TOOLS AND THE LIKE

SUGITA KATSUYUKI (JP)
NISHINO KOUJI (JP)
HIRATA KAORU (JP)
OGAWA SHINYA (JP)
IDEGUCHI KEISUKE (JP)

PCT/JP2021/001601

September 10, 2021

January 19, 2021

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FUJIKIN KK (JP)

G05B11/36; G05D7/06

WO2019163676A1	2019-08-29
WO2013115298A1	2013-08-08
WO2018180745A1	2018-10-04

JP2014236569A	2014-12-15
JP2001147723A	2001-05-29
JP2001092501A	2001-04-06
JP2000188894A	2000-07-04

TANIDA Ryuichi et al. (JP)

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