FLOW RATE CONTROL DEVICE AND METHOD, AND FLUID SUPPLY SYSTEM

WIPO Patent Application WO/2022/039047

A1

A flow rate control device according to one embodiment comprises: a holding unit 101 which holds the opening characteristics of a flow rate control valve; an input unit 102 which inputs a target flow rate of a fluid flowing out from the flow rate control valve and a flow rate change speed until the target flow rate is reached; a detection unit 103 which detects the flow rate of the fluid flowing out of the flow rate control valve at a predetermined sampling cycle from the start of control to the target flow rate; and an opening degree adjustment unit 104 which adjusts the opening degree of the flow rate control valve. The opening degree adjustment unit 104 specifies a difference between a flow rate detected by the detection unit 103 and a planned flow rate that is in the middle of the target flow rate corresponding to the detected flow rate and is determined on the basis of the flow rate change speed and the number of detections by the detection unit 103, and when there is the difference, calculates, from a Cv value of the opening degree characteristics, the opening degree corresponding to the planned flow rate as an adjusting opening degree. Then, the opening degree is controlled with an opening degree operation amount as a target value, the opening degree operation amount being calculated on the basis of the opening degree difference between the adjusting opening degree and the current opening degree of the flow rate adjusting valve.

SAKAI KATSUTOSHI (JP)
FUKUZAWA YUKI (JP)

PCT/JP2021/029257

February 24, 2022

August 06, 2021

Click for automatic bibliography generation  

SHINWA CONTROLS CO LTD (JP)

G05D7/06

JP2020009423A	2020-01-16
JPH06119057A	1994-04-28
JP2019045076A	2019-03-22

NAKAMURA Yukitaka et al. (JP)

View/Download PDF      PDF Help

Previous Patent: BINDING TAPE

Next Patent: HIGH-PRESSURE FUEL PUMP