Title:
FUNCTIONALLY GRADIENT MATERIALS AND THE MANUFACTURE THEREOF
Document Type and Number:
WIPO Patent Application WO1999067075
Kind Code:
A3
Abstract:
This invention relates to the synthesis of A1/SiC based functionally gradient materials using a new technique termed here as gradient slurry disintegration and deposition. Gradients of SiC were successfully established using this technique for the starting weight percentages up to 20 %. The results were confirmed using microstructural characterization techniques and microhardness measurements. Functionally gradient materials synthesized using this method holds the promise where differential tribological characteristics and the strength/toughness combinations may be required from the opposite surfaces.
Inventors:
GUPTA MANOJ (SG)
Application Number:
PCT/SG1999/000055
Publication Date:
June 22, 2000
Filing Date:
June 04, 1999
Export Citation:
Assignee:
UNIV SINGAPORE (SG)
GUPTA MANOJ (SG)
GUPTA MANOJ (SG)
International Classes:
C22C1/10; (IPC1-7): C23C6/00; C22C1/10
Other References:
DATABASE WPI Week 199005, Derwent World Patents Index; AN 1990-033023
DATABASE WPI Week 198150, Derwent World Patents Index; AN 1981-92279D
DATABASE WPI Week 198150, Derwent World Patents Index; AN 1981-92279D
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