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Patent Searching and Data


Title:
GAS SUPPLY AMOUNT MEASUREMENT METHOD AND GAS SUPPLY AMOUNT CONTROL METHOD
Document Type and Number:
WIPO Patent Application WO/2021/200227
Kind Code:
A1
Abstract:
This gas supply amount measurement method is conducted in a gas supply system provided with a vaporization unit, a control valve on the downstream side of the vaporization unit, and a supply pressure sensor that measures a supply pressure between the vaporization unit and the control valve, the method comprising: a step for measuring an initial supply pressure using the supply pressure sensor in a state where the control valve is closed; a step for opening the control valve for a predetermined period of time; a step for measuring, a plurality of times, the supply pressure in a period of time from a time at which a decrease in pressure from the initial supply pressure began to a time at which a predetermined period of time has elapsed during the predetermined period of time in which the control valve is opened; and a step for finding, by calculation based on a plurality of measured values of the supply pressure, a gas supply amount during the predetermined period of time that the control valve was opened.

Inventors:
NAKATANI TAKATOSHI (JP)
HIDAKA ATSUSHI (JP)
NAGASE MASAAKI (JP)
NISHINO KOUJI (JP)
IKEDA NOBUKAZU (JP)
Application Number:
PCT/JP2021/011117
Publication Date:
October 07, 2021
Filing Date:
March 18, 2021
Export Citation:
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Assignee:
FUJIKIN KK (JP)
International Classes:
G01F1/34; G01F25/00
Attorney, Agent or Firm:
TANIDA Ryuichi et al. (JP)
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