Title:
GAS SUPPLY DETERMINATION METHOD AND PLASMA GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/044427
Kind Code:
A1
Abstract:
Provided is a gas supply determination method for a plasma generation device provided with a first supply port and a second supply port. The plasma generation device is provided with: a first supply device for supplying a first gas from the first supply port; and a second supply device that is connected to the first supply device and is for supplying a second gas from the second supply port. The gas supply determination method comprises: a first supply step in which the supply of the first gas by the first supply device is started in a state in which the supply of the second gas by the second supply device is stopped; a first measurement step for measuring the flow rate of the gas supplied from the first supply port after the first supply step; and a first notification step for notifying the state of supplying the first gas from the first supply port according to the flow rate measurement result in the first measurement step.
Inventors:
TAKIKAWA SHINJI (JP)
JINDO TAKAHIRO (JP)
JINDO TAKAHIRO (JP)
Application Number:
PCT/JP2018/031693
Publication Date:
March 05, 2020
Filing Date:
August 28, 2018
Export Citation:
Assignee:
FUJI CORP (JP)
International Classes:
H05H1/26; G01F1/00
Foreign References:
| JP2014036024A | 2014-02-24 | |||
| US20140041804A1 | 2014-02-13 | |||
| JP2016046503A | 2016-04-04 | |||
| JP2007234762A | 2007-09-13 | |||
| JP2008235611A | 2008-10-02 |
Attorney, Agent or Firm:
NEXT INTERNATIONAL et al. (JP)
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