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Patent Searching and Data


Title:
GAS SUPPLY MODULE FOR ATOMIC LAYER DEPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/190696
Kind Code:
A1
Abstract:
A gas supply module for atomic layer deposition according to an embodiment of the present invention includes: a case; and a gas supply unit which is provided inside the case and sprays an atomic layer deposition gas, including a source gas, a purge gas, and a reaction gas, simultaneously in different areas of a deposition target substrate. The gas supply unit is formed to have multiple levels with respect to the height direction of the case, and can diffuse the atomic layer deposition gas from one side to the other side through diffusion holes that are provided in each of the levels.

Inventors:
CHOI HAG YOUNG (KR)
CHOI YEONG TAE (KR)
KIM DONG WON (KR)
KIM SANG HUN (KR)
KIM KEUN SIK (KR)
Application Number:
PCT/KR2018/004393
Publication Date:
October 18, 2018
Filing Date:
April 16, 2018
Export Citation:
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Assignee:
NEXUSBE CO LTD (KR)
International Classes:
C23C16/455
Foreign References:
KR20150019957A2015-02-25
KR20160134908A2016-11-24
KR20110056528A2011-05-30
KR20090097401A2009-09-16
JP2015526595A2015-09-10
Attorney, Agent or Firm:
SHIM, Kyoung-Shik et al. (KR)
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