Title:
HAFNIUM PRECURSOR COMPOUND, COMPOSITION FOR FORMING HAFNIUM-CONTAINING FILM, COMPRISING SAME, AND METHOD FOR FORMING HAFNIUM-CONTAINING FILM
Document Type and Number:
WIPO Patent Application WO/2022/169290
Kind Code:
A1
Abstract:
The present application relates to a hafnium precursor compound, a precursor composition for forming a hafnium-containing film, comprising the hafnium precursor compound, and a method for forming a hafnium-containing film by using the precursor composition.
More Like This:
Inventors:
KOH WONYONG (KR)
KIM JIN SIK (KR)
KIM BYUNG KWAN (KR)
YU DA SOM (KR)
CHOI JUN HWAN (KR)
KIM JIN SIK (KR)
KIM BYUNG KWAN (KR)
YU DA SOM (KR)
CHOI JUN HWAN (KR)
Application Number:
PCT/KR2022/001746
Publication Date:
August 11, 2022
Filing Date:
February 04, 2022
Export Citation:
Assignee:
UP CHEMICAL CO LTD (KR)
International Classes:
C23C16/40; C07F7/00; C23C16/18; C23C16/30; C23C16/34; C23C16/455
Foreign References:
KR20090075837A | 2009-07-09 | |||
KR20140140654A | 2014-12-09 |
Other References:
CAI HU ET AL: "Amide-Silyl Ligand Exchanges and Equilibria among Group 4 Amide and Silyl Complexes", INORGANIC CHEMISTRY, AMERICAN CHEMICAL SOCIETY, EASTON , US, vol. 46, no. 19, 1 January 2007 (2007-01-01), Easton , US , pages 8071 - 8078, XP002468430, ISSN: 0020-1669, DOI: 10.1021/ic7010293
YU XIANGHUA ET AL: "Unusual Equilibria Involving Group 4 Amides, Silyl Complexes, and Silyl Anions via Ligand Exchange Reactions", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, AMERICAN CHEMICAL SOCIETY, vol. 126, no. 14, 1 January 2004 (2004-01-01), pages 4472 - 4473, XP002468431, ISSN: 0002-7863, DOI: 10.1021/ja031899y
WEILLER BRUCE H.: "Chemical Vapor Deposition of TiN from Tetrakis(dimethylamido)titanium and Ammonia: Kinetics and Mechanistic Studies of the Gas-Phase Chemistry", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, AMERICAN CHEMICAL SOCIETY, vol. 118, no. 21, 1 January 1996 (1996-01-01), pages 4975 - 4983, XP002468434, ISSN: 0002-7863, DOI: 10.1021/ja953468o
YU XIANGHUA ET AL: "Unusual Equilibria Involving Group 4 Amides, Silyl Complexes, and Silyl Anions via Ligand Exchange Reactions", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, AMERICAN CHEMICAL SOCIETY, vol. 126, no. 14, 1 January 2004 (2004-01-01), pages 4472 - 4473, XP002468431, ISSN: 0002-7863, DOI: 10.1021/ja031899y
WEILLER BRUCE H.: "Chemical Vapor Deposition of TiN from Tetrakis(dimethylamido)titanium and Ammonia: Kinetics and Mechanistic Studies of the Gas-Phase Chemistry", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, AMERICAN CHEMICAL SOCIETY, vol. 118, no. 21, 1 January 1996 (1996-01-01), pages 4975 - 4983, XP002468434, ISSN: 0002-7863, DOI: 10.1021/ja953468o
Attorney, Agent or Firm:
MAPS INTELLECTUAL PROPERTY LAW FIRM (KR)
Download PDF: