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Title:
HAFNIUM PRECURSOR COMPOUND, COMPOSITION FOR FORMING HAFNIUM-CONTAINING FILM, COMPRISING SAME, AND METHOD FOR FORMING HAFNIUM-CONTAINING FILM
Document Type and Number:
WIPO Patent Application WO/2022/169290
Kind Code:
A1
Abstract:
The present application relates to a hafnium precursor compound, a precursor composition for forming a hafnium-containing film, comprising the hafnium precursor compound, and a method for forming a hafnium-containing film by using the precursor composition.

Inventors:
KOH WONYONG (KR)
KIM JIN SIK (KR)
KIM BYUNG KWAN (KR)
YU DA SOM (KR)
CHOI JUN HWAN (KR)
Application Number:
PCT/KR2022/001746
Publication Date:
August 11, 2022
Filing Date:
February 04, 2022
Export Citation:
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Assignee:
UP CHEMICAL CO LTD (KR)
International Classes:
C23C16/40; C07F7/00; C23C16/18; C23C16/30; C23C16/34; C23C16/455
Foreign References:
KR20090075837A2009-07-09
KR20140140654A2014-12-09
Other References:
CAI HU ET AL: "Amide-Silyl Ligand Exchanges and Equilibria among Group 4 Amide and Silyl Complexes", INORGANIC CHEMISTRY, AMERICAN CHEMICAL SOCIETY, EASTON , US, vol. 46, no. 19, 1 January 2007 (2007-01-01), Easton , US , pages 8071 - 8078, XP002468430, ISSN: 0020-1669, DOI: 10.1021/ic7010293
YU XIANGHUA ET AL: "Unusual Equilibria Involving Group 4 Amides, Silyl Complexes, and Silyl Anions via Ligand Exchange Reactions", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, AMERICAN CHEMICAL SOCIETY, vol. 126, no. 14, 1 January 2004 (2004-01-01), pages 4472 - 4473, XP002468431, ISSN: 0002-7863, DOI: 10.1021/ja031899y
WEILLER BRUCE H.: "Chemical Vapor Deposition of TiN from Tetrakis(dimethylamido)titanium and Ammonia: Kinetics and Mechanistic Studies of the Gas-Phase Chemistry", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, AMERICAN CHEMICAL SOCIETY, vol. 118, no. 21, 1 January 1996 (1996-01-01), pages 4975 - 4983, XP002468434, ISSN: 0002-7863, DOI: 10.1021/ja953468o
Attorney, Agent or Firm:
MAPS INTELLECTUAL PROPERTY LAW FIRM (KR)
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