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Title:
HALOGENATED ALKENE COMPOUND AND METHOD FOR MANUFACTURING FLUORINATED ALKYNE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2020/171011
Kind Code:
A1
Abstract:
A halogenated alkene compound and a halogenated alkyne compound are obtained at a high conversion rate and selectivity by employing any of the following methods (1) through (4): (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7 (where X1, X2, X3, X4, X5, X6, and X7 are the same or different, and are halogen atoms) is subjected to a dehydrofluorination reaction; (2) a halogenated butene compound represented by CX1X2X3CX4=CHCX5X6X7 (where X1, X2, X3, X4, X5, X6, and X7 are the same as above) is subjected to a dehydrohalogenation reaction; (3) a halogenated alkane compound represented by CHX8A1CHX9A2 (where A1 and A2 are fluorine atoms or perfluoroalkyl groups, and X8 and X9 are the same or different, and are halogen atoms) is subjected to a dehydrohalogenation reaction in a vapor phase in the presence of a catalyst; and (4) a halogenated alkene compound represented by CX8A1=CHA2 (where A1, A2, and X8 are the same as above) is subjected to a dehydrohalogenation reaction in the presence of a catalyst.

Inventors:
ETOU YUUSUKE (JP)
NAKAMURA SHINGO (JP)
Application Number:
PCT/JP2020/006018
Publication Date:
August 27, 2020
Filing Date:
February 17, 2020
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
International Classes:
C07B61/00; C07C21/18; C07C17/25; C07C21/20; C07C21/22
Domestic Patent References:
WO2012067864A12012-05-24
Foreign References:
JP2015530417A2015-10-15
JP2010189338A2010-09-02
JP2009269891A2009-11-19
JP2007320874A2007-12-13
JP2004292329A2004-10-21
JP2017515789A2017-06-15
JP3412165B22003-06-03
Other References:
CHAMBERS, RICHARD D. ET AL.: "Eliminations from 2h-heptafluorobut-2-ene", JOURNAL OF FLUORINE CHEMISTRY, vol. 79, 1996, pages 121 - 124, XP004069912
Attorney, Agent or Firm:
SAEGUSA & PARTNERS (JP)
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