Title:
HIGH-PURITY N-(5-METHOXY-2-PHENOXYPHENYL)METHANESULFONAMIDE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2021/241725
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing N-(5-methoxy-2-phenoxyphenyl)methanesulfonamide with a reduced amount of impurities; and a method for producing the same. According to the present invention, provided are: N-(5-methoxy-2-phenoxyphenyl)methanesulfonamide which is an iguratimod intermediate and which has an extremely low content of impurities; and a method for producing the same. By using N-(5-methoxy-2-phenoxyphenyl)methanesulfonamide with an extremely low content of impurities, it is possible to produce iguratimod with an extremely low content of impurities.
Inventors:
NAGATO YUSUKE (JP)
Application Number:
PCT/JP2021/020368
Publication Date:
December 02, 2021
Filing Date:
May 28, 2021
Export Citation:
Assignee:
FUJIFILM TOYAMA CHEMICAL CO LTD (JP)
International Classes:
C07C303/38; C07C303/44; C07C311/08
Domestic Patent References:
| WO2021020481A1 | 2021-02-04 |
Foreign References:
| JPH0249778A | 1990-02-20 | |||
| CN107021891A | 2017-08-08 | |||
| CN109400507A | 2019-03-01 | |||
| CN106986797A | 2017-07-28 |
Attorney, Agent or Firm:
SIKS & CO. (JP)
Download PDF: