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Patent Searching and Data


Title:
HIGH-TEMPERATURE VALVE DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/086778
Kind Code:
A1
Abstract:
A high-temperature valve device (40, 140), which can be positioned under a reactor (10) for generating silicon, is provided with: a first tube-shaped member (50) connected to the interior space of the reactor, and capable of introducing silicon generated in the reactor; a valve (64) positioned in the first tube-shaped member; and a heater (100) capable of heating a heating region including the valve and part of the first tube-shaped member from the reactor to the valve to a temperature greater than or equal to the boiling point of the related substances pertaining to the generation of silicon in the reactor.

Inventors:
NAKAHARA KATSUMASA (JP)
KONDOU MASASHI (JP)
TAKEUCHI YOSHINORI (JP)
SAKAKI DAISUKE (JP)
Application Number:
PCT/JP2011/079867
Publication Date:
June 28, 2012
Filing Date:
December 22, 2011
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
NAKAHARA KATSUMASA (JP)
KONDOU MASASHI (JP)
TAKEUCHI YOSHINORI (JP)
SAKAKI DAISUKE (JP)
International Classes:
F16K49/00; C01B33/033; F16K1/22; F16K1/226
Domestic Patent References:
WO2010134544A12010-11-25
Foreign References:
JPH07167307A1995-07-04
JPH11270701A1999-10-05
Attorney, Agent or Firm:
KAWAMOTO, Manabu et al. (JP)
Manabu Kawamoto (JP)
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