Title:
HUMIDITY CONDITIONING GAS GENERATOR
Document Type and Number:
WIPO Patent Application WO/2021/033260
Kind Code:
A1
Abstract:
Provided is an improved humidity conditioning gas generator so as to be applicable to a semiconductor manufacturing process. This humidity conditioning gas generator 1 has: a saturation tank body 2 which has disposed therein a gas region G and a water reservoir region W that is located below the gas region G; and a gas back-flow apparatus 4 which is disposed inside the saturation tank body 2. The gas back-flow apparatus 4 has a gas return pipe 40, a gas delivery pipe 41, a water drainage pipe 42, and a trap box 43. The gas return pipe 40 extends from a gas inlet port 40a disposed inside the gas region G to a gas outlet port 40b disposed inside the trap box 43 by way of the interior of the water reservoir region W. The gas delivery pipe 41 extends from a gas delivery inlet port 41a disposed inside the trap box 43 to a gas delivery outlet port 41b disposed outside the saturation tank body 2. The water drainage pipe 42 extends from a water inlet port 42a disposed inside the trap box 43 to a water outlet port 42b disposed outside the saturation tank body 2.
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Inventors:
OGURA MASAO (JP)
Application Number:
PCT/JP2019/032425
Publication Date:
February 25, 2021
Filing Date:
August 20, 2019
Export Citation:
Assignee:
MICRO EQUIPMENT INC (JP)
International Classes:
B01J19/00; F24F6/02
Foreign References:
| JP2018087664A | 2018-06-07 | |||
| JPH02280808A | 1990-11-16 | |||
| JP2004340565A | 2004-12-02 | |||
| JP2006504460A | 2006-02-09 | |||
| JP2007514915A | 2007-06-07 | |||
| JP2014121682A | 2014-07-03 |
Attorney, Agent or Firm:
WILLFORT INTERNATIONAL PATENT FIRM (JP)
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