Title:
ILLUMINATION OPTICAL ASSEMBLY FOR A PROJECTION EXPOSURE APPARATUS
Document Type and Number:
WIPO Patent Application WO/2016/034450
Kind Code:
A3
Abstract:
An illumination optical assembly (11) for a projection exposure apparatus comprises a first facet element (6) having a multiplicity of first facets (21i), which are formed in each case by a multiplicity of displaceable individual mirrors (31), and a second facet element (7) having a multiplicity of second facets (25i). Here the displacement positions of the individual mirrors (31) of the first facets (21i) are chosen in each case in such a way that in the case of a predefined intensity distribution (36) of an illumination radiation (3) in an intermediate focus (ZF) the illumination radiation (3) in the region of the facets (25i) of the second facet element (7) has an intensity distribution (37), with a maximum which is at most equal to a predefined maximum intensity (I *) or which is greater than a mean value of the intensity distribution (37) by at most a predefined factor or absolute value.
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Inventors:
ENDRES MARTIN (DE)
BIELING STIG (DE)
BIELING STIG (DE)
Application Number:
PCT/EP2015/069371
Publication Date:
June 09, 2016
Filing Date:
August 24, 2015
Export Citation:
Assignee:
ZEISS CARL SMT GMBH (DE)
International Classes:
G03F7/20
Foreign References:
| DE102012204273A1 | 2013-09-19 | |||
| US20120154777A1 | 2012-06-21 | |||
| DE102010029765A1 | 2011-12-08 |
Attorney, Agent or Firm:
RAU, SCHNECK & HÜBNER PATENTANWÄLTE RECHTSANWÄLTE PARTGMBB (Nürnberg, DE)
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