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Patent Searching and Data


Title:
IMAGING DEVICE AND METHOD FOR FABRICATING SAME
Document Type and Number:
WIPO Patent Application WO/2021/099878
Kind Code:
A1
Abstract:
Provided is a highly reliable storage device. A method for fabricating a storage device comprising a first insulator, a first conductor disposed on the first insulator and having a first opening, a second insulator disposed on the first conductor and having a second opening, a second conductor disposed on the second insulator and having a third opening, a third insulator disposed on the second conductor, and semiconductors provided in the first opening to the third opening comprises: forming a first insulator; forming a first conductor on the first insulator; forming a second insulator on the first conductor; forming a fourth insulator on the second insulator; forming a third insulator on the fourth insulator; forming a third opening in the fourth insulator; forming a second opening in the second insulator; forming a first opening in the first conductor; forming semiconductors in the first opening to the third opening; removing the fourth insulator; and forming a second conductor between the second insulator and the third insulator.

Inventors:
SAWAI HIROMI (JP)
MURAKAWA TSUTOMU (JP)
KUNITAKE HITOSHI (JP)
Application Number:
PCT/IB2020/060502
Publication Date:
May 27, 2021
Filing Date:
November 09, 2020
Export Citation:
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Assignee:
SEMICONDUCTOR ENERGY LAB (JP)
International Classes:
H01L21/28; H01L21/336; H01L21/8234; H01L21/8242; H01L27/06; H01L27/088; H01L27/108; H01L27/11556; H01L27/1156; H01L29/786; H01L29/788; H01L29/792
Domestic Patent References:
WO2019003060A12019-01-03
Foreign References:
JP2011249803A2011-12-08
JP2016063027A2016-04-25
JP2019024087A2019-02-14
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