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Title:
IMMERSION LIQUID SUPPLY SYSTEM AND IMMERSION LIQUID FLOW FIELD REMOVAL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2022/126748
Kind Code:
A1
Abstract:
Disclosed are an immersion liquid supply system and an immersion flow field removal method therefor. The immersion liquid supply system comprises an immersion liquid supply source, a liquid supply valve and an immersion liquid suction assembly, wherein the liquid supply valve is connected to a main liquid injection port of an immersion liquid supply device by means of a tail end liquid supply flow path, and the immersion liquid suction assembly and the tail end liquid supply flow path form a fluid connection; once the liquid supply valve is closed, the immersion liquid suction assembly exerts a suction effect on residual immersion liquid in the tail end liquid supply flow path, so that the residual immersion liquid is kept in the tail end liquid supply flow path under the action of atmospheric pressure, or the residual liquid is discharged from the tail end liquid supply flow path, thereby preventing contamination and erosion caused by the leakage of the residual immersion liquid from the main liquid injection port to a photoetching machine component, or further preventing the residual immersion liquid from contaminating and eroding the tail end liquid supply flow path and an immersion liquid supply recovery device. The amount of immersion liquid accumulated in the tail end liquid supply flow path is effectively reduced once an immersion flow field is removed to mitigate the contamination and erosion of the immersion liquid to the photoetching machine component.

Inventors:
FU XIN (CN)
ZHAO YIWEN (CN)
WU MIN (CN)
XU NING (CN)
CHEN WENYU (CN)
Application Number:
PCT/CN2020/140554
Publication Date:
June 23, 2022
Filing Date:
December 29, 2020
Export Citation:
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Assignee:
ZHEJIANG CHEER TECH CO LTD (CN)
International Classes:
G03F7/20
Foreign References:
CN101430508A2009-05-13
CN104624430A2015-05-20
US20070242243A12007-10-18
Attorney, Agent or Firm:
HANGZHOU SIKERUI PATENT OFFICE CO., LTD (CN)
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