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Patent Searching and Data


Title:
IMPRINT DEVICE AND METHOD FOR MANUFACTURING ARTICLE
Document Type and Number:
WIPO Patent Application WO/2019/065250
Kind Code:
A1
Abstract:
This imprint device for using a mold to form a pattern composed of an imprint material on a substrate comprises: a mold holding part for holding a mold; and an optical system for irradiating the imprint material (14) on the substrate (10) with irradiation light for increasing the viscosity of the imprint material (14), wherein: the irradiation light has a light intensity distribution (56) in which the light intensity increases from the center to a side surface of a pattern part of the mold in a state in which the mold is held by the mold holding part; and the imprint material (14) moving, in a region including the side surface (8b) of the pattern part (8a) of the mold, from the center toward the side surface (8b) of the pattern part (8a) of the mold is irradiated with the irradiation light in a state in which the mold and the imprint material (14) on the substrate (10) are contacted with each other.

Inventors:
HAYASHI TATSUYA (JP)
FUNAYOSHI TOMOMI (JP)
KOBAYASHI KENICHI (JP)
Application Number:
PCT/JP2018/033851
Publication Date:
April 04, 2019
Filing Date:
September 12, 2018
Export Citation:
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Assignee:
CANON KK (JP)
International Classes:
H01L21/027; B29C59/02
Foreign References:
JP2011521438A2011-07-21
JP2011181548A2011-09-15
JP2016058735A2016-04-21
JP2014179527A2014-09-25
JP2016096269A2016-05-26
JP2014229670A2014-12-08
JP2013069918A2013-04-18
JP2013110196A2013-06-06
JP2003249444A2003-09-05
JP2014188869A2014-10-06
JP2015106670A2015-06-08
Attorney, Agent or Firm:
ABE Takuma et al. (JP)
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