INORGANIC STRUCTURE AND METHOD FOR PRODUCING SAME

Title:

INORGANIC STRUCTURE AND METHOD FOR PRODUCING SAME

Document Type and Number:

WIPO Patent Application WO/2021/241194

Kind Code:

A1

Abstract:

An inorganic structure (1A) comprises a plurality of inorganic particles (2), and a bonding portion (3) that covers the surface of the inorganic particles (2) and bonds between the inorganic particles (2). The bonding portion (3) contains: an amorphous compound including silicon, oxygen, and one or more metal elements; and microparticles (4) having an average particle size of 100 nm or less. A method for producing the inorganic structure (1A) has: a step for mixing a plurality of inorganic particles (11), a plurality of silicon dioxide particles (12) that are amorphous, and an aqueous solution (13) containing a metal element to thereby obtain a mixture; and a step for pressurizing and heating the mixture under a pressure of 10-600 MPa and a temperature of 50-300°C.

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Inventors:

SATO NATSUKI
SAWA RYOSUKE
YOSHIOKA TATSURO
KURIZOE NAOKI
SEKINO TOHRU
GOTO TOMOYO
CHO SUNGHUN
SEO YEONGJUN

Application Number:

PCT/JP2021/017828

Publication Date:

December 02, 2021

Filing Date:

May 11, 2021

Export Citation:

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Assignee:

PANASONIC IP MAN CO LTD (JP)

International Classes:

B28B3/00; C01B33/20; C01F5/02; C03C10/00; C04B28/00; C04B35/04; C04B35/16; C09J1/00

Domestic Patent References:

WO2020017526A1

2020-01-23

Foreign References:

KR20100021685A	2010-02-26
JP2012230948A	2012-11-22
JPH09509392A	1997-09-22
JPH1192242A	1999-04-06
JP2011046602A	2011-03-10
JP2020092473A	2020-06-11

Other References: