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Title:
LASER APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/118280
Kind Code:
A1
Abstract:
According to an embodiment of the present invention, provided is a laser apparatus comprising: a laser generator which includes a laser medium, a pumping light source for supplying light to the laser medium, and a first mirror and a second mirror arranged with the laser medium therebetween, and generates laser of a first wavelength; a second harmonic generator including a non-linear medium for generating laser of a second wavelength from the laser of the first wavelength; an optical modulator arranged between the laser medium and the second harmonic generator and adjusting a pulse width of the laser of the first wavelength; and an output adjuster for adjusting an output of the laser of the second wavelength generated by the second harmonic generator.

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Inventors:
CHO WOOK RAE (KR)
LEE JIN HU (KR)
JEON MIN JEE (KR)
Application Number:
PCT/KR2020/018102
Publication Date:
June 17, 2021
Filing Date:
December 10, 2020
Export Citation:
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Assignee:
LUTRONIC CORP (KR)
International Classes:
H01S3/109; A61B18/20; A61B18/22; A61N5/06; H01S3/08; H01S3/081; H01S3/10
Foreign References:
KR20190054668A2019-05-22
KR20080088440A2008-10-02
JP2010054547A2010-03-11
KR20150101081A2015-09-03
KR20190052796A2019-05-17
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
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