LIQUID ATOMIZATION SYSTEM, MIST-GENERATING SYSTEM, AND LIQUID ATOMIZATION METHOD

WIPO Patent Application WO/2021/059923

A1

The present invention generates liquid droplets with nanometer particle sizes more stably. A surface (21) of a substrate (2) has a border (251) of a through hole (25) located, in the propagation direction (D4), between the through hole (25) and the intersection region (33) of an IDT electrode (3), as viewed in the thickness direction. The liquid atomization system (1) atomizes an overspill portion of the liquid by means of surface elastic waves. The overspill portion is the portion that exceeds the border (251) from the through hole (25) and spills over into the surface elastic wave propagation region (23) of the substrate (2). The border (251) has a first end (2511) and a second end (2512). Using a virtual line (VL1), which is orthogonal to the propagation direction (D4) and passes through the first end (2511) and/or the second end (2512), as a reference, when the IDT electrode (3)-side is plus and the side opposite to the IDT electrode (3)-side is minus, the angle of inclination of the border (251) with respect to the virtual line (VL1) is -90 degrees to 45 degrees.

UEMURA MARIKO
UEDA MITSUHIKO
SAKAI JUN
KATAYAMA HIROYUKI

PCT/JP2020/033569

April 01, 2021

September 04, 2020

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PANASONIC IP MAN CO LTD (JP)

B05B17/06

WO2019198162A1

2019-10-17

JP2012143726A	2012-08-02
JP2012148256A	2012-08-09
JP2008104974A	2008-05-08
JP2005111471A	2005-04-28
JP2005257408A	2005-09-22
JP2019513353A	2019-05-30
JPH04166873A	1992-06-12
JPH10193592A	1998-07-28

HOKUTO PATENT ATTORNEYS OFFICE (JP)

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