Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
LIQUID PROCESSING DEVICE AND LIQUID PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/182036
Kind Code:
A1
Abstract:
[Problem] To provide a liquid processing device that prevents foreign matter from mixing into a processing liquid supplied to a base board. [Solution] Constituted is a device comprising: a nozzle (22) whereby a processing liquid supplied from a processing liquid supply source (23) and serving to process a base board is discharged onto the base board; a main flow path connecting the processing liquid supply source (23) and the nozzle (22) to one another; a filter (26) provided in the main flow path; a branch path (41A) branching from the main flow path; a pump (42) provided at an end of the branch path (41A); and a control unit (10) serving to send control signals so as to execute a first step of executing liquid suction by means of the pump (42) so that the processing liquid supplied from the processing liquid supply source (23) flows into the branch path (41A), followed by a second step of discharging the processing liquid from the pump (42) to the branch path (41A) in an amount that is less than the capacity of the branch path (41A) such that the processing liquid is discharged from the nozzle (22).

Inventors:
IDE HIROYUKI (JP)
SHITE HIDEO (JP)
YOSHIHARA KOUSUKE (JP)
Application Number:
PCT/JP2019/011799
Publication Date:
September 26, 2019
Filing Date:
March 20, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/027; B05C11/00; B05C11/10; B05D1/26; B05D3/00
Foreign References:
JP2011014732A2011-01-20
JP2007222703A2007-09-06
JP2018001082A2018-01-11
JP2014222756A2014-11-27
JP2000027813A2000-01-25
JP2016087548A2016-05-23
JP2005230691A2005-09-02
Attorney, Agent or Firm:
YAYOY PATENT OFFICE (JP)
Download PDF: